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SiO2 Associates was incubated

• At Arizona State University in the department of Physics where our partners were faculty, business professionals, academic professionals, and graduates.

• Inside the CIMD laboratory located within the IBeAM laboratory at the Goldwater Center at ASU.

• The patent portfolio is, in part, a partnership with ASU and developed with Arizona Technology Enterprise (AZTE).

N. Herbots, Q. Xing, M. Hart, J. D. Bradley, D. A. Sell, R. J. Culbertson, Barry J. Wilkens; IBMM of OH Adsorbates and Interphases on Si-based Materials. Nuclear Instruments and Methods in Physics Research, Section B. IBMM 17^th International Conference Proceeds (Aug, 2010), accepted for publication.

Q. Xing, M. A. Hart, R. J. Culbertson, J. D. Bradley, N. Herbots, B. J. Wilkens, D. A. Sell, C. F. Watson; Particle-Induced X-ray Emission (PIXE) of Silicate Coatings on High Impact Resistance Polycarbonates. Proceeds of the 21^st International Conference on the Application of Accelerators in Research and Industry (August, 2010), accepted for publication.

Q. Xing, N. Herbots, M. Hart, J. D. Bradley, B. J. Wilkens, D. A. Sell, C. H. Sell, H. M. Kwong, R. J. Culbertson, and S. D. Whaley; Ion Beam Analysis of Silicon-Based Surfaces and Correlation with Surface Energy Measurements. Proceeds of the 21^st International Conference on the Application of Accelerators in Research and Industry (August, 2010), accepted for publication.

J. D. Bradley, N. Herbots, R. Culbertson, J. Shaw, V. Atluri; A New 3D Multistring Code to Identify Compound Oxide Nanophase With Ion Channeling. Characterization of Oxide/Semiconductor Interfaces for CMOS Technologies, edited by Y. Chabal, A. Estève, N. Richard, G. Wilk (Mater. Res. Soc. Symp. Proc. Volume 996E, Warrendale, PA, 2007), 0996-H05-14.

N. Herbots, J. D. Bradley, R. Culbertson, J. Shaw, V. Atluri; IBA of Ordered Ultra-thin SiO₂ Grown on (1x1) Si(100). Characterization of Oxide/Semiconductor Interfaces for CMOS Technologies, edited by Y. Chabal, A. Estève, N. Richard, G. Wilk (Mater. Res. Soc. Symp. Proc. Volume 996E, Warrendale, PA, 2007), 0996-H05-13.

Shaw, J. M. ; Herbots, N. ; Hurst, Q. B. ; Bradley, D. ; Culbertson, R. J. ; Atluri, V. ; Queeney, K. T. Atomic displacement free interfaces and atomic registry in SiO2/(1x1) Si(100). Journal of Applied Physics. Vol 100. No 10 (2006) 104109-10410.

Queeney, K. T. ; Herbots, N. ; Shaw, Justin M. ; Atluri, V. ; Chabal, Y. J. Infrared spectroscopic analysis of an ordered Si/SiO2 interface. Applied Physics Letters. Vol 84. No 4 (2004) 493-495.

Herbots, N., Shaw, J.M., Hurst, Q.B., Grams, M.P., Culbertson, R.J., Smith, D.J., Atluri, V., Zimmerman, P. & Queeney, K.T. The formation of ordered,ultrathin SiO2/Si(100) interfaces grown on (1 x1) Si(100). Materials Science & Engineering, B87 (2001), 303-316.

Atluri, V. ; Herbots, N. ; Dagel, D. ; Bhagvat, S. ; Whaley, S. Hydrogen passivation of Si( 100) wafers as templates for low temperature ( T < 600°C) epitaxy. Nuclear Instruments and Methods in Physics Research B 118 (1996) 144-150.

Herbots, N. ; Peihua, Y. ; Jacobsson, H. ; Xiang, J. ; Hearne, S. The onset of secondary phase precipitation during synthesis of heteroepitaxial Si_1-x-yGe_xC_y on Si(100). Appl. Phys. Lett. 68 (6), (1995) 782-784.

US Provisional Patent Application, Filed: June 22, 2010, Control of Condensation via Monolayers on Materials for Vision. Inventor(s): J. D. Bradley, M. Hart, Q. Bradley, N. Herbots, C. F. Watson, J. Mitchell

US Patent Application, Filed: November 09, 2010, pending Molecular films for controlling hydrophobic, hydrophilic, optical, condensation and geometric properties of silicone implants surfaces, including intra-occular lenses used in cataract surgeries. Inventor(s): N. Herbots, J. D. Bradley, M. Hart, D. A. Sell, S. Whaley, Q. Bradley

US Patent Application, Filed: April 30, 2009, pending Low Temperature (25° - 200 °C) Wafer Bonding via a cross-bonding nano-interphase (SILOXSI) for biomedical and device application, including an EpOxNox processing tools. Inventor(s): Nicole Herbots, Robert J. Culbertson, James Bradley, Murdock Allen Hart, David Alexander Sell and Shawn David Whaley

US Patent 7,851,365 B1, (granted 12/14/2010). Methods for Preparing Semiconductor Substrates and Interfacial OxidesThereon. Inventor(s): N. Herbots, J. D. Bradley, J. M. Shaw, R. J. Culbertson & V. Atluri

M8-040 (10/28/07), Single/Dual 12" Wafer Processing EPOX R&D Flexible Bench: A Single/Dual 1-16" Wafer Wet Processing Clean Room Bench for R&D and Epoxides (EPOX) Technology. Inventor(s): N. Herbots, J. D. Bradley, J. M. Shaw, R. J. Culbertson & V. Atluri