We are a technology transfer company focused on
design and synthesis of nanophases and their insertion into
electronic, photovoltaic, and medical implant manufacturing.
We design and synthesize below 480K (200oC) new "designer interphases" for silicon/silicate devices, which we call NanoOxides™. We design NanoOxides™ with unique mechanical, electronic and/or photovoltaic properties, building on our recent success in creating commensurate and discommensurate silica interfacial phases on OH-terminated (1x1)Si(100) at RT via our patented chemical processing in ambient.
Precursor phases nucleated by chemical and thermal processing at temperature below 480 K inside our Class 10 clean-room, are used as templates for synthesizing NanoOxides.
Applications reside in four areas (1) medical implants (2) high longevity/performance photovoltaics encapsulation (3) high-k dielectrics for C-MOS gates (4) NanoBonding™ where two silicon-based substrates, such as quartz, Si, or borosilicate pairs are bonded hermetically at the molecular level.